RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER

摘要

PROBLEM TO BE SOLVED: To provide a resist composition excellent in lithographic characteristics and a pattern feature, a novel polymer useful for the resist composition, and a method for forming a resist pattern using the resist composition.

SOLUTION: The resist composition includes a base component (A) which shows changes in solubility with a developing solution by an action of an acid and generates an acid by exposure. The base component (A) includes a polymer having an anion moiety that generates an acid by exposure at least on one end of the main chain and having a mass average molecular weight of 20000 or less.

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