| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint device advantageous in terms of uniformity of processing applied to an entire substrate, even when using a gas useful for a filling property and a releasing property of a resin with respect to a mold. <P>SOLUTION: An imprint device 1 for molding an uncured resin 15 on a substrate 12 by a mold 8 and curing the resin to form a pattern of the cured resin 15 on the substrate 12, comprises: a gas supply mechanism 4 for, when pressing the mold 8 to the uncured resin 15, supplying a gas from a side of the mold 8 toward the substrate 12, and recovering the supplied gas on the side of the mold 8; a substrate holding unit 5 movable while holding the substrate 12, and having a flat plate part 22 arranged in the outside so as to surround the substrate 12 at a surface height matching a surface of the held substrate 12; and a gas recovering mechanism 25 for recovering a gas entering a gap region 24 between an outer peripheral side surface of the substrate 12 held by the substrate holding unit 5 and an inner peripheral side surface facing the substrate 12 of the flat plate part 22. <P>COPYRIGHT: (C)2013,JPO&INPIT |
