| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method which replace an accumulated processing liquid with another processing liquid without disturbing upward flow in a processing tank. <P>SOLUTION: A processing unit 10 includes a third discharge nozzle 221 which discharges a processing liquid toward a lower taper surface 163 of a groove 16, formed on a side wall 507 of an inner tank 15 and having a V shaped cross section surface, and forms a relatively slow speed liquid current in the inner tank 15. A plate like member 18 blocks the upward flow, from among the flow which is discharged from the third discharge nozzle 221 and collides with the lower taper surface 163 of the inner tank 15, thereby efficiently replacing the processing liquid without disturbing upward flow in the inner tank 15. <P>COPYRIGHT: (C)2013,JPO&INPIT |
