| 发明名称 |
SEMICONDUCTOR STRUCTURE AND PROCESS THEREOF |
| 摘要 |
A semiconductor structure includes a substrate, a recess and a material. The recess is located in the substrate, wherein the recess has an upper part and a lower part. The minimum width of the upper part is larger than the maximum width of the lower part. The material is located in the recess.
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| 申请公布号 |
US2013093062(A1) |
申请公布日期 |
2013.04.18 |
| 申请号 |
US201113276306 |
申请日期 |
2011.10.18 |
| 申请人 |
LIN YING-CHIH;CHEN HSUAN-HSU;LIAO JIUNN-HSIUNG;KUO LUNG-EN |
发明人 |
LIN YING-CHIH;CHEN HSUAN-HSU;LIAO JIUNN-HSIUNG;KUO LUNG-EN |
| 分类号 |
H01L29/02;H01L21/302 |
主分类号 |
H01L29/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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