发明名称 ION SOURCE AND ION BEAM DEVICE USING SAME
摘要 Provided is a charged particle beam microscope which has an emitter tip exhibiting a small mechanical oscillation amplitude, is capable of producing ultra-high resolution sample observation images, and eliminates blurring in the sample observation images. More specifically, provided is a charged particle beam microscope which is equipped with a gas field ionization source having an emitter tip for generating ions, an emitter base mount for supporting the emitter tip, a mechanism for heating the emitter tip, an extraction electrode provided facing the emitter tip, and a mechanism for supplying gas to the vicinity of the emitter tip. The gas field ionization source is characterized in that: the emitter tip heating mechanism heats the emitter tip by electrifying a filament connecting at least two terminals; the terminals are connected by a V-shaped filament; the angle of the V-shape is obtuse; and the emitter tip is connected approximately to the centre of the filament.
申请公布号 WO2013054799(A1) 申请公布日期 2013.04.18
申请号 WO2012JP76161 申请日期 2012.10.10
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 SHICHI HIROYASU;MATSUBARA SHINICHI;OSE YOICHI;KAWANAMI YOSHIMI;ARAI NORIAKI
分类号 H01J27/26;H01J37/08;H01J37/28 主分类号 H01J27/26
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