| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique which is advantageous to drawing in a multi-beam type drawing device even when abnormal charged particles exist. <P>SOLUTION: A drawing device has a charged particle optical system, a restriction part and a control part. The charged particle optical system generates charged particle beams of (MxN) arranged as follows: With respect to lines containing N charged particle beams of n or more which are arranged at a first pitch along a first direction, there exist M lines of m or more which are arranged at a second pitch along a second direction perpendicular to the first direction. With respect to lines from a first line to an m-th line out of the M lines, the positions in the first direction of the charged particle beams at the heads of the respective lines are displaced from one another by (1/m) of the first pitch, and the position in the first direction of the charged particle beam at the head of the (m+i)-th line is equal to the position in the first direction of the charged particle beam at the head of the i-th line. When any abnormal beam exists in the charged particle beams of (MxN), the control part controls the restriction part so that lines containing n sequential charged particle beams which do contain the abnormal beam can be continuously used along the second direction by only the number corresponding to the divisor of m. <P>COPYRIGHT: (C)2013,JPO&INPIT |
