| 发明名称 |
DEPOSITION CHAMBER CLEANING SYSTEM AND METHOD |
| 摘要 |
An in-situ method of cleaning a vacuum deposition chamber can include flowing at least one reactive gas into the chamber. |
| 申请公布号 |
US2013095601(A1) |
申请公布日期 |
2013.04.18 |
| 申请号 |
US201213689345 |
申请日期 |
2012.11.29 |
| 申请人 |
FIRST SOLAR, INC.;FIRST SOLAR, INC. |
发明人 |
BECK MARKUS E. |
| 分类号 |
B08B5/00;H01L31/18 |
主分类号 |
B08B5/00 |
| 代理机构 |
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