| 摘要 |
PURPOSE: An apparatus for drying a substrate is provided to prevent the leaning phenomenon that patterns are broken down by rapidly evaporating materials remaining in patterns of the substrate. CONSTITUTION: A drying chamber(110) has a drying space for a substrate. A substrate loading part(111) is rotatably installed in the drying chamber. A gas supply part(130) is mounted on the drying chamber. The gas supply part evaporates deionized water and isopropyl alcohol. An absorption part(150) sucks evaporated deionized water and isopropyl alcohol. [Reference numerals] (121) DIW supply; (123) IPA supply |
