ACTINIC RAY SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a hole pattern having an ultrafine pore diameter, excellent in circularity while maintaining excellent dependence on development time.

SOLUTION: There is provided an actinic ray sensitive or radiation sensitive resin composition including: (P) a resin having a repeating unit (a) represented by the following general formula (I); (B) a compound that generates an organic acid by irradiation with an actinic ray or radiation; and (C) a basic compound or an ammonium salt compound that decreases basicity by irradiation with the actinic ray or radiation. A molar ratio [C]/[B] of the compound (C) to the compound (B) is 0.4 or more. A resist film, a pattern forming method, a method for manufacturing an electronic device and an electronic device using the same are also provided. In the general formula (I), R0represents a hydrogen atom or a methyl group. R1, R2and R3each independently represent a linear or branched alkyl group.

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