| 摘要 |
[Problem] To provide: a composition which is capable of forming a fine negative photoresist pattern that is free from defects such as rough surface, bridge defect and un-resolved pattern; and a pattern forming method using the composition. [Solution] A composition for forming a fine pattern, which is used for the purpose of miniaturizing a pattern by thickening a resist pattern in a method for forming a negative resist pattern using a chemically amplified resist composition, and which is characterized by containing a solvent and a polymer that has a structure represented by formula (A), (B) or (C) in a repeating unit. A fine pattern is formed by applying the composition to a negative photoresist pattern, which is obtained by development using an organic solvent developer, and heating the resulting negative photoresist pattern. |
