| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition and an antireflective coating for photolithography. <P>SOLUTION: A first composition includes at least: a compound F1 selected from the following (A) formula 1, wherein Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; and R1, R2, R3 are each independently selected from alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and other three specific silicon-containing compounds. <P>COPYRIGHT: (C)2013,JPO&INPIT |
