发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME |
摘要 |
Provided is an actinic-ray- or radiation-sensitive resin composition that simultaneously achieves excellent developability and excellent immersion-liquid tracking properties, and a method of forming a pattern using the same. The composition contains a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formula (I) below. |
申请公布号 |
US2013095429(A1) |
申请公布日期 |
2013.04.18 |
申请号 |
US201113807508 |
申请日期 |
2011.07.07 |
申请人 |
IIZUKA YUSUKE;SHIBUYA AKINORI;TAKAHASHI HIDENORI;FUKUHARA TOSHIAKI;KOSHIJIMA KOUSUKE;FUJIFILM CORPORATION |
发明人 |
IIZUKA YUSUKE;SHIBUYA AKINORI;TAKAHASHI HIDENORI;FUKUHARA TOSHIAKI;KOSHIJIMA KOUSUKE |
分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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