| 摘要 |
An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.5×d wherein D is the distance between the plane containing the infrared radiation sources and the photomask and d is the distance between the center points of two neighboring infrared radiation sources, and in that the gas injection system comprises a plurality of gas injectors distributed in a plane parallel to the plane of the photomask in such a way that the injectors follow a 90° rotational invariance about the center point of the photomask. |
