<p>This cleaning device (100) is provided with: a rotating brush (10) that cleans a surface (SF) to be cleaned and has a rotating shaft (10X) that intersects the surface (SF) to be cleaned; a frame (20) that supports the rotating brush (10); a rotation prevention mechanism (30) that prevents the frame (20) from rotating with respect to the surface (SF) to be cleaned during cleaning of the surface (SF) to be cleaned by the rotating brush (10); a support body (30) that supports the frame (20) on the surface (SF) to be cleaned such that the rotating brush (10) contacts the surface (SF) to be cleaned; a moving mechanism (30) that moves the frame (20) over the surface (SF) to be cleaned; and a control unit (40) that controls the moving mechanism (30).</p>
申请公布号
WO2013054627(A1)
申请公布日期
2013.04.18
申请号
WO2012JP73376
申请日期
2012.09.12
申请人
SUMITOMO HEAVY INDUSTRIES, LTD.;MAKINO, FUMINORI;TAKEUCHI, KOHSUKE