| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a contact exposure device and a contact exposure method capable of improving adhesion property of a substrate and a mask. <P>SOLUTION: A holding surface 11a of a substrate holding part 11 is provided with a plurality of first air flow holes 31 and a plurality of second air flow holes 32 provided outside the plurality of first air flow holes 31, the first air flow holes and the second air flow holes being bored toward the back surface of a workpiece W, and on the inner peripheral side and the outer peripheral side of a region E in which the plurality of second air flow holes 32 are bored, an annular inner peripheral side elastic member 33 and an outer peripheral side elastic member 34 that are able to be in contact with the back surface of the workpiece W are disposed, respectively. Between a mask holding part 4 and the substrate holding part 11, an elastic sealing member 35 that surrounds a mask M and the workpiece W is provided, and a sealed space S is defined by the mask M, the mask holding part 4, the substrate holding part 11, and the sealing member 35. Control means 30 causes the plurality of first air flow holes 31 to be open to the atmosphere, sucks in air from the plurality of second air flow holes 32, sucks in air within the sealed space S to make the pressure in the sealed space S negative pressure, and when the pressure in the sealed space S reaches a predetermined reference negative pressure, causes the plurality of second air flow holes 32 to be open to the atmosphere. <P>COPYRIGHT: (C)2013,JPO&INPIT |
