| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad having improved dressing properties while hardness is maintained. <P>SOLUTION: The polishing pad has a polishing layer formed of a polyurethane resin foam containing continuous cells. The polyurethane resin foam contains, as starting material components, (A) an isocyanate component, (B) a polyol component, and (C) an aromatic compound that has one hydroxyl group and/or am aromatic compound that has one amino group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
