RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION WHICH COMPRISES ORGANIC PLATINUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID RAW MATERIAL FOR CHEMICAL VAPOR DEPOSITION

摘要

The present invention is a raw material for chemical vapor deposition, which can be used for the production of a platinum thin film or a platinum compound thin film by a chemical vapor deposition method, and which comprises an organic platinum compound represented by formula (1) in which a cyclooctadiene and an alkyl anion are coordinated with bivalent platinum. In the raw material, it is particularly preferred that the combination of R1 and R2 in the formula is any one selected from a combination of a propyl group and a methyl group, a combination of a propyl group and an ethyl group and a combination of an ethyl group and a methyl group. (In the formula, R1 and R2 independently represent an alkyl group, wherein R1 and R2 are different from each other and the total number of carbon atoms in R1 and R2 is 3 to 5.)