发明名称 NON-VOLATILE MEMORY AND MANUFACTURING METHOD THEREOF
摘要 A non-volatile memory and a manufacturing method thereof are provided. A first oxide layer having a protrusion is formed on a substrate. A pair of doped regions is formed in the substrate at two sides of the protrusion. A pair of charge storage spacers is formed on the sidewalls of the protrusion. A second oxide layer is formed on the first oxide layer and the charge storage spacers. A conductive layer is formed on the second oxide layer.
申请公布号 US2013092997(A1) 申请公布日期 2013.04.18
申请号 US201113271517 申请日期 2011.10.12
申请人 CHENG CHIH-CHIEH;YAN SHIH-GUEI;CHENG CHENG-HSIEN;TSAI WEN-JER;MACRONIX INTERNATIONAL CO., LTD. 发明人 CHENG CHIH-CHIEH;YAN SHIH-GUEI;CHENG CHENG-HSIEN;TSAI WEN-JER
分类号 H01L29/792;H01L21/336 主分类号 H01L29/792
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