发明名称 |
METHOD FOR PRODUCING SILICON WAVEGUIDES ON NON-SOI SUBSTRATE |
摘要 |
The present invention relates to a method for producing silicon waveguides on non-SOI substrate (non-silicon-on-insulator substrate), and particularly relates to a method for producing silicon waveguides on silicon substrate with a laser. This method includes the following steps: (1) forming a ridge structure with high aspect ratio on a non-SOI substrate; (2) melting and reshaping the ridge structure by laser illumination for forming a structure having broad upper part and narrow lower part; and (3) oxidizing the structure having broad upper part and narrow lower part to form a silicon waveguide.
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申请公布号 |
US2013095659(A1) |
申请公布日期 |
2013.04.18 |
申请号 |
US201213458900 |
申请日期 |
2012.04.27 |
申请人 |
LIN CHING-FUH;HUNG SHIH-CHE;SYU SHU-JIA;NATIONAL TAIWAN UNIVERSITY |
发明人 |
LIN CHING-FUH;HUNG SHIH-CHE;SYU SHU-JIA |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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地址 |
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