发明名称 REPLACEMENT GATE MULTIGATE TRANSISTOR FOR EMBEDDED DRAM
摘要 A memory cell, an array of memory cells, and a method for fabricating a memory cell with multigate transistors such as fully depleted finFET or nano-wire transistors in embedded DRAM. The memory cell includes a trench capacitor, a non-planar transistor, and a self-aligned silicide interconnect electrically coupling the trench capacitor to the non-planar transistor.
申请公布号 US2013092992(A1) 申请公布日期 2013.04.18
申请号 US201113274758 申请日期 2011.10.17
申请人 CHANG JOSEPHINE B.;CHANG LELAND;GUILLORN MICHAEL A.;HAENSCH WILFRIED E.;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHANG JOSEPHINE B.;CHANG LELAND;GUILLORN MICHAEL A.;HAENSCH WILFRIED E.
分类号 H01L27/108;B82Y99/00;H01L21/02 主分类号 H01L27/108
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