| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition capable of suppressing occurrence of pattern collapse or bridge defects after developing, and having a high residual film ratio, in a negative pattern formation by means of organic solvent developing, and to provide a resist film, a pattern forming method, a method for manufacturing an electronic device, and an electronic device using the same. <P>SOLUTION: There is provided an actinic ray sensitive or radiation sensitive resin composition including: a resin (P) having a repeating unit (a) represented by the following general formula (I); a compound (B) represented by any one of specific general formulae (B-1) to (B-3); and a solvent. In the general formula (I), R<SB POS="POST">0</SB>represents a hydrogen atom or a methyl group. R<SB POS="POST">1</SB>, R<SB POS="POST">2</SB>and R<SB POS="POST">3</SB>each independently represent a linear or branched alkyl group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
