METHOD OF FORMING OPEN-NETWORK POLISHING PAD

摘要

PROBLEM TO BE SOLVED: To provide a method of forming an open-network polishing pad having a soft texture configuration.

SOLUTION: A curable polymer sheet or film is exposed to an energy source to form an exposure pattern having elongated sections. After attaching the polymer sheet or film to an open-network substrate 40, uncured polymer is removed by a solvent. This forms elongated channels throughout the entire polymer sheet or film into a texture configuration pattern that corresponds to the exposure pattern, and the open-network substrate 40 supports the polymer. The elongated channels extend throughout the entire thickness of the polymer sheet or film to thereby form the open-network polishing pad 60.

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