METHOD AND APPARATUS FOR ALIGNING NANOWIRES DEPOSITED BY AN ELECTROSPINNING PROCESS
摘要
<p>Embodiments of the invention generally include apparatus and methods for depositing nanowires in a predetermined pattern during an electrospinning process. An apparatus includes a nozzle for containing and ejecting a deposition material, and a voltage source coupled to the nozzle to eject the deposition material. One or more electric field shaping devices are positioned to shape the electric field adjacent to a substrate to control the trajectory of the ejected deposition material. The electric field shaping device converges an electric field at a point near the surface of the substrate to accurately deposit the deposition material on the substrate in a predetermined pattern. The methods include applying a voltage to a nozzle to eject an electrically-charged deposition material towards a substrate, and shaping one or more electric fields to control the trajectory of the electrically-charged deposition material. The deposition material is then deposited on the substrate in a predetermined pattern.</p>
申请公布号
WO2013055506(A1)
申请公布日期
2013.04.18
申请号
WO2012US56208
申请日期
2012.09.20
申请人
APPLIED MATERIALS, INC.;LESCHKIES, KURTIS;VERHAVERBEKE, STEVEN;VISSER, ROBERT
发明人
LESCHKIES, KURTIS;VERHAVERBEKE, STEVEN;VISSER, ROBERT