| 摘要 |
<p>A liquid processing apparatus (10) of the present invention comprises a substrate holding portion (21) which holds a substrate horizontally, and a rotatable top plate (32) which covers the substrate held by the substrate holding portion (21) from above to form a processing space (30). In the processing space (30), a liquid medicine is supplied by a chemical solution nozzle (82a) to the substrate, and an atmosphere substituent gas is supplied by a substitution nozzle (82c) into the processing space (30). The substitution nozzle (82c) is supported by a substitution nozzle supporting arm (82) which moves horizontally between an advanced position in the processing space (30) and a retracted position out of the processing space (30), and discharges the atmosphere substituent gas upwards from an upper portion of the substrate.</p> |
