| 摘要 |
PROBLEM TO BE SOLVED: To provide an etchant composition which can efficiently, excellently, simultaneously and collectively etch a multiple film including a copper layer comprises one or more layers of copper or copper alloy such as a Cu/Mo laminated metal film, a Cu/Mo alloy laminated metal film and a Cu alloy/Mo alloy laminated metal film, and a molybdenum layer comprises one or more layers of molybdenum or molybdenum alloy, and to provide a etching method for the multiple film using the same. SOLUTION: The etchant composition contains 50-80 wt.% of phosphoric acid, 0.5-10 wt.% of nitric acid, 5-30 wt.% of acetic acid, 0.01-5 wt.% of imidazole with respect to the total weight, and the balance water. The imidazole as an additive functions as a copper/molybdenum galvanic reaction controller. COPYRIGHT: (C)2012,JPO&INPIT |
