| 摘要 |
An electron beam evaporator comprises a filament 5 and a source material 7 that define an evaporation region and an insulator 4 having an insulating surface arranged to face the evaporation region, wherein the insulating surface is configured to prevent a continuous conductive film forming thereon. The insulating surface preferably comprises one or more insulating holes such that it is discontinuous. The evaporator may further comprise a slip ring (11, figure 2) operable to minimise cable movement and settling. The evaporator preferably comprises a water cooled jacket (3, figure 1) operable to provide a low out-gassing rate. Also disclosed is an electron beam evaporator comprising an electrical conducting means, a movable film thickness monitor (8, figure 2) and a shutter (1), wherein the electrical conducting means comprises a conducting slip ring arrangement (11) operable to provide a stable rate meter reading.
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