发明名称 THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF
摘要 <p>PURPOSE: A thin film transistor array panel and a manufacturing method thereof are provided to form a first contact hole, a second contact hole, a source electrode, and a drain electrode using one mask, thereby preventing disconnection between a semiconductor layer and a source and a drain electrode due to the misalignment of a mask. CONSTITUTION: A semiconductor layer(150) is formed on a substrate(110). The semiconductor layer includes a source region(152), a drain region(154), and a channel region(156). A gate electrode(124) is overlapped with the channel region of the semiconductor layer on a first insulating layer(114). A first contact hole(146) and a second contact hole(148) are formed on the first insulating layer and a second insulating layer(140). A source electrode(173) is formed on the second insulating layer to surround the first contact hole. A drain electrode(175) is formed on the second insulating layer to surround the second contact hole.</p>
申请公布号 KR20130037963(A) 申请公布日期 2013.04.17
申请号 KR20110102550 申请日期 2011.10.07
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 HONG, PIL SOON;PARK, GWUI HYUN;BYUN, JIN SU;KIM, SANG GAB
分类号 H01L29/786;G02F1/136 主分类号 H01L29/786
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