发明名称 |
Method for the protection of an optical element, device manufacturing method, and lithographic apparatus including an optical element |
摘要 |
<p>A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H 2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H 2 from the H 2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.</p> |
申请公布号 |
EP1643310(B1) |
申请公布日期 |
2013.04.17 |
申请号 |
EP20050109177 |
申请日期 |
2005.10.04 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS;BANINE, VADIM YEVGENYEVICH;MOORS, JOHANNES HUBERTUS JOSEPHINA;SPEE, CAROLUS IDA MARIA ANTONIUS;KLUNDER, DERK JAN WILFRED;ZALM, PETER CORNELIS |
分类号 |
G03F7/20;B08B7/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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