MANUFACTURING METHOD OF SILICON NANO-TIP ARRAY AND SILICON NANO-TIP ARRAY MANUFACTURED BY THE SAME

摘要

PURPOSE: A method for manufacturing a silicon nanotip array and a silicon nanotip array manufactured by the same are provided to freely form the shape and the arrangement of initial mask patterns and to control the shape and the arrangement of nanotips. CONSTITUTION: An antireflection layer and a photoresist layer are successively formed on a silicon oxide layer formed by oxidizing a silicon substrate(step a). A micro pattern is regularly formed on the photoresist layer(step b). A dry etching process is performed by using the photoresist layer as a mask to selectively remove the silicon oxide layer(step c). A dry etching process is performed by using the silicon oxide layer as a mask to form a nanotip(step d). The silicon oxide layer is removed(step e). [Reference numerals] (AA) Start; (BB) Forming an oxide layer on a silicon substrate and coating BARC and a photosensitizer; (CC) Step a; (DD) Forming a micro pattern on the photoresist layer; (EE) Step b; (FF) Dry-etching a silicon oxide layer; (GG) Step c; (HH) Dry-etching the silicon substrate; (II) Step d; (JJ) Removing the silicon oxide layer; (KK) Step e; (LL) End;