发明名称 APPARATUS AND PROCESS FOR DEPOSITION OF POLYCRYSTALLINE SILICON
摘要 PURPOSE: A device and a method for attaching poly-crystal silicon are provided to manufacture polycrystalline rod from high purity silicon having rough surface with economically low cost by locating a filament rod and a gas inlet inside of a reactor. CONSTITUTION: A device for attaching poly-crystal silicon comprises a reactor wall(32) and a reactor chamber. The reactor chamber comprises 20 or more of filament rods and a gas inlet(22) for a gas reaction inside of the reactor chamber. The each filament rod except the filament rod near the reactor wall comprises 3 extra filament rods near 150-450mm and 1-3 of close gas inlet holes.
申请公布号 KR20130038167(A) 申请公布日期 2013.04.17
申请号 KR20120110624 申请日期 2012.10.05
申请人 WACKER CHEMIE AG 发明人 MIKHAIL SOFIN
分类号 C01B33/035;C30B29/06;C30B31/10 主分类号 C01B33/035
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