| 摘要 |
<p>PURPOSE: A substrate processing apparatus is provided to remove bubbles and foreign materials in a chemical solution using a plate, thereby minimizing the generation of bubbles and foreign materials. CONSTITUTION: A buffer tank stores a chemical solution discharged from a development chamber. The buffer tank includes a housing, a collection tub(230), a partition wall(250), a heating member(270), and a plate(220). The collection tub collects the chemical solution discharged from a vent. The collection tub has a body(232) and a discharge pipe(236). The partition wall divides the internal space of the housing. The heating member heats the chemical solution supplied through a gap. The plate removes bubbles and foreign materials in a chemical solution which is supplied to a hole(212).</p> |
