发明名称 Semiconductor storage device and method of fabricating the same
摘要 A semiconductor storage device includes a memory cell array, a plurality of word lines, a plurality of bit lines, a first gate wiring element 3a, 3b, a second gate wiring element 3c, 3d, a first connector 5a, 5b, and a second connector 5c, 5d. Each memory cell 10 has first and second sets having a driver transistor 11, a load transistor 12, and an access transistor 13. The word lines are arranged in parallel to each other along a first direction. The bit lines are arranged in parallel to each other along a second direction perpendicular to the first direction. The first gate wiring element comprises a gate electrode of the first driver transistor and the first load transistor, and has a rectangular shape having straight line on opposite sides. The second gate wiring element comprises a gate electrode of the access transistor and has a rectangular shape having straight line on opposite sides.
申请公布号 US8422274(B2) 申请公布日期 2013.04.16
申请号 US201113296956 申请日期 2011.11.15
申请人 TOMITA HIDEMOTO;OHBAYASHI SHIGEKI;ISHIGAKI YOSHIYUKI;RENESAS ELECTRONICS CORPORATION 发明人 TOMITA HIDEMOTO;OHBAYASHI SHIGEKI;ISHIGAKI YOSHIYUKI
分类号 G11C11/41;H01L21/3205;G11C5/02;G11C5/06;H01L21/8244;H01L27/11 主分类号 G11C11/41
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