Non-volatile memory with active ionic interface region

摘要

An example memory cell may have at least a tunneling region disposed between a conducting region and a metal region, wherein the tunneling region can have at least an active interface region disposed between a first tunneling barrier and a second tunneling barrier. A high resistive film is formed in the interface region with migration of ions from both the metal and conducting regions responsive to a write current to program the memory cell to a selected resistive state.