发明名称 |
Nano-imprint mold and substrate with uneven patterns manufactured by using the mold |
摘要 |
According to one embodiment, a nano-imprint mold includes plural pairs of first and second protrusions formed on a base layer, each of which is formed along the same straight line. Each protrusion has a top surface and four side surfaces. The first and second protrusions are mirror-symmetrical with each other. A first side surface of the first protrusion and a second side surface of the second protrusion face each other. A first angle between the first side surface or the second side surface and a main surface of the base layer is not less than 85° and not more than 90°. A second angle between a third side surface in the first protrusion or a fourth side surface in the second protrusion and the main surface of the base layer is not less than 70° and not more than 88°. The first angle is larger than the second angle. |
申请公布号 |
US8419412(B2) |
申请公布日期 |
2013.04.16 |
申请号 |
US201213422897 |
申请日期 |
2012.03.16 |
申请人 |
OHSAWA YUICHI;ITO JUNICHI;ARIGA TOMOTAKA;KUROSAKI YOSHINARI;KASHIWADA SAORI;KABUSHIKI KAISHA TOSHIBA |
发明人 |
OHSAWA YUICHI;ITO JUNICHI;ARIGA TOMOTAKA;KUROSAKI YOSHINARI;KASHIWADA SAORI |
分类号 |
B29C59/00 |
主分类号 |
B29C59/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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