发明名称 Nano-imprint mold and substrate with uneven patterns manufactured by using the mold
摘要 According to one embodiment, a nano-imprint mold includes plural pairs of first and second protrusions formed on a base layer, each of which is formed along the same straight line. Each protrusion has a top surface and four side surfaces. The first and second protrusions are mirror-symmetrical with each other. A first side surface of the first protrusion and a second side surface of the second protrusion face each other. A first angle between the first side surface or the second side surface and a main surface of the base layer is not less than 85° and not more than 90°. A second angle between a third side surface in the first protrusion or a fourth side surface in the second protrusion and the main surface of the base layer is not less than 70° and not more than 88°. The first angle is larger than the second angle.
申请公布号 US8419412(B2) 申请公布日期 2013.04.16
申请号 US201213422897 申请日期 2012.03.16
申请人 OHSAWA YUICHI;ITO JUNICHI;ARIGA TOMOTAKA;KUROSAKI YOSHINARI;KASHIWADA SAORI;KABUSHIKI KAISHA TOSHIBA 发明人 OHSAWA YUICHI;ITO JUNICHI;ARIGA TOMOTAKA;KUROSAKI YOSHINARI;KASHIWADA SAORI
分类号 B29C59/00 主分类号 B29C59/00
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