发明名称 |
Method of fine patterning a thin film and method of manufacturing a display substrate using the method |
摘要 |
A method of fine patterning a thin film and a method of manufacturing a display substrate by using the same, in which a fine photo pattern is formed on a base substrate, and a photoresist pattern is formed on the thin film. A fine photo pattern is formed by ashing the photoresist pattern. A fine pattern is formed by removing the thin film exposing through the fine photo pattern. A fine pattern is formed, and the fine pattern has a higher resolution than that of an exposure apparatus. The reliability of a process for manufacturing a display substrate and the display quality of a display device may be improved. |
申请公布号 |
US8420302(B2) |
申请公布日期 |
2013.04.16 |
申请号 |
US20090480132 |
申请日期 |
2009.06.08 |
申请人 |
UM YOON-SUNG;KIM SU-JEONG;YOU HYE-RAN;LYU JAE-JIN;PARK SEUNG-BEOM;SAMSUNG DISPLAY CO., LTD. |
发明人 |
UM YOON-SUNG;KIM SU-JEONG;YOU HYE-RAN;LYU JAE-JIN;PARK SEUNG-BEOM |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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