发明名称 Method of fine patterning a thin film and method of manufacturing a display substrate using the method
摘要 A method of fine patterning a thin film and a method of manufacturing a display substrate by using the same, in which a fine photo pattern is formed on a base substrate, and a photoresist pattern is formed on the thin film. A fine photo pattern is formed by ashing the photoresist pattern. A fine pattern is formed by removing the thin film exposing through the fine photo pattern. A fine pattern is formed, and the fine pattern has a higher resolution than that of an exposure apparatus. The reliability of a process for manufacturing a display substrate and the display quality of a display device may be improved.
申请公布号 US8420302(B2) 申请公布日期 2013.04.16
申请号 US20090480132 申请日期 2009.06.08
申请人 UM YOON-SUNG;KIM SU-JEONG;YOU HYE-RAN;LYU JAE-JIN;PARK SEUNG-BEOM;SAMSUNG DISPLAY CO., LTD. 发明人 UM YOON-SUNG;KIM SU-JEONG;YOU HYE-RAN;LYU JAE-JIN;PARK SEUNG-BEOM
分类号 G03F7/20 主分类号 G03F7/20
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