| 摘要 |
PURPOSE: A thin film deposition apparatus is provided to maintain a substrate in an upright position, thereby preventing a deposition fail due to bending of the substrate. CONSTITUTION: A thin film deposition apparatus comprises a deposition chamber(10), a substrate supporting unit(20), and a substrate pushing-pulling unit. The deposition chamber provides a space for deposition on a substrate. The substrate supporting unit supports the substrate in an upright position in the deposition chamber. The substrate pushing-pulling unit pushes or pulls the center portion of the substrate from the backside of the substrate, thereby correcting bending of the substrate due to its weight. The substrate punching-pulling unit comprises one or more suction pipes(30) and a pipe driving unit moving the suction pipes. |
