摘要 |
PURPOSE: A polishing device and a polishing method are provided to remove foreign substances such as an inclusion adhering to the surface of a workpiece. CONSTITUTION: A polishing device comprises a frame(100), a horizontal transfer unit(200), a polishing wheel unit(300), and a polishing wheel transfer unit(400). The frame forms a space which accommodates a workpiece(A). The horizontal transfer unit is formed in the inner side of the frame. The polishing wheel unit comprises a polishing wheel(310) which contact-polishes the surface of the workpiece. The polishing wheel transfer unit vertically and horizontally transfers the polishing wheel unit. [Reference numerals] (AA) Top and bottom; (BB) Front and back; (CC) Horizontal; |