| 摘要 |
<p>PURPOSE: A coating fluid for diffusing boron is provided to coat a substrate with sufficient impurities after a spin coating process. CONSTITUTION: An n-type silicon substrate(1) is provided. One surface of the silicon substrate is coated with a coating fluid. A p-type diffusion layer(2) is formed on the silicon substrate. An n-type diffusion layer(3) is formed on the remaining surface of the silicon substrate. A front electrode(6) and a rear electrode(5) are formed on the front and the rear of the silicon substrate, respectively. The coating fluid includes a boron compound, an organic binder, a silicon compound, an alumina precursor, water, and/or organic solvents.</p> |
