| 摘要 |
PURPOSE: A symmetric plasma process chamber is provided to uniformly control plasma by enhancing the symmetry of electricity, gas flow, and heat. CONSTITUTION: A symmetric plasma process chamber comprises a chamber cover assembly(110), a chamber body assembly(140), and an exhaust assembly(190). The chamber cover assembly is insulated from the chamber body assembly and comprises an upper electrode(112) and a chamber cover(114). The upper electrode is supported by the chamber body assembly. The chamber body surrounds the upper electrode. The chamber body assembly comprises a chamber body(142). The chamber body is formed of conductive materials such as aluminum or stainless steel. The exhaust assembly is positioned on the bottom of the chamber body adjacent to a vacuum exhaust section(104). |
