| 摘要 |
An exposure apparatus and a controlling method thereof are provided to prevent a substrate and a mask from being damaged by securing a space when the substrate and the mask are loaded or unloaded. A mask(50) is loaded on or unloaded from a mask stage(10). A substrate stage(20) is positioned at a position in which the mask stage is not positioned, and a substrate is loaded on the substrate stage. The substrate stage is moved to a position in which the mask stage is positioned by a moving member(23). The substrate stage has a chuck(25) supporting the substrate, and the mask stage has a light source(80) for forming a pattern on the substrate. |
