| 摘要 |
PURPOSE: A coating device for plasma is provided to increase reaction efficiency by gasifying a reactant at controlled temperature and pressure and to coat the reactant at a constant thickness by generating uniform plasma reaction area more widely. CONSTITUTION: A coating device for plasma comprises an atmospheric pressure plasma device(100) and a gasifying device(200). The atmospheric pressure plasma device comprises multiple electrodes to form uniform plasma area. The gasifying device is arranged in the outside of the atmospheric pressure plasma device to provide a gasified reactant to the atmospheric pressure plasma device.
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