| 摘要 |
An apparatus for processing a large-area substrate is provided to improve process uniformity of the front surface of a large-area substrate by enabling uniform deposition of process chemical. A transfer part(20) transfers a large-area substrate(10). A deposition guide(40) is installed in a position separated from the lateral part of the large-area substrate on the transfer part by such an interval that process chemical is not lost. A slit nozzle(30) deposits process chemical to a part of the upper part of the large-area substrate having the deposition guide at its lateral part. The interval between the large-area substrate and the deposition guide can be 0.1~1 mm. |
