| 摘要 |
The method of fabricating photomasks comprises at least one step of cleaning the photomask and at least one step of laying a protective film on the photomask after it has been fabricated. The method according to the invention furthermore includes at least one step of removing the ammoniacal and sulphate residues between the cleaning step and the film application step. This step comprises the following operations: the photomask is placed in a sealed enclosure; a low pressure is established in the sealed enclosure by pumping out the gases that it contains; the photomask is subjected to infrared irradiation; the infrared irradiation is stopped; a check is made that the temperature of the photomask is at most equal to 50°C; atmospheric pressure is re-established in the enclosure; and the photomask is extracted from the enclosure. The device for implementing the method according to the invention comprises a sealed enclosure containing at least one photomask, a pumping unit for creating and maintaining the vacuum inside the enclosure, a system for holding at least one photomask in place, positioned inside the sealed enclosure, infrared irradiation means, and a gas injection system. |
