发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
摘要 |
PURPOSE: An apparatus and method for processing a substrate are provided to prevent a developer from being undulated by separately collecting a first processing solution and smoothly substituting the first processing solution for a second processing solution. CONSTITUTION: A first processing solution supply unit supplies a first processing solution to a substrate(G). A gas supply unit(21) supplies a preset gas to the surface of the substrate in which the first processing solution is collected. A second rinse nozzle discharges a second processing solution to the surface of the substrate. A first rinse nozzle(22) discharges the second processing solution to the surface of the substrate to which the gas is supplied. A solution collecting unit(27) forms a solution collected part extended in a width direction of the substrate on a substrate transfer path by the second processing solution supplied by the first rinse nozzle.
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申请公布号 |
KR20130036700(A) |
申请公布日期 |
2013.04.12 |
申请号 |
KR20120080534 |
申请日期 |
2012.07.24 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KUBO MAKOTO;SADA TETSUYA;NAGATA ATSUSHI;NISHIMURA SATOSHI;FUJIWARA MASAKI |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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