| 摘要 |
PURPOSE: A substrate coating apparatus is provided to minimize a moment component in a rolling direction generated in a transfer process of a liquid chemical nozzle, thereby accurately controlling the position of the liquid chemical nozzle. CONSTITUTION: A substrate coating apparatus(100) comprises a substrate stage(110); a pair of sliders(120) which move in one direction from both side of the substrate stage; a support bar(130) connecting the pair of sliders across the substrate stage; a liquid chemical nozzle(140) spreading liquid chemical on the surface of the untreated substrate; a crossbar(145) which is installed to move up and down; and a driving unit which is located under the substrate stage and moves the cross bar up and down. |
