发明名称 SCANNING ELECTRON MICROSCOPE
摘要 <P>PROBLEM TO BE SOLVED: To reduce an image drift occurring while measuring a plurality of points in a sample. <P>SOLUTION: A static elimination is conducted after acquiring a length measurement image by electron beam irradiation with a scanning at a magnification lower than that of a scanning for length measurement image acquisition. At that time, a magnification is so set that a scanning area becomes 20 &mu;m square or larger and 200 &mu;m square or smaller. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013065420(A) 申请公布日期 2013.04.11
申请号 JP20110202560 申请日期 2011.09.16
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 HAYATA YASUNARI;OKAI NOBUHIRO;SATO HIDETOSHI;WANG JIKANG
分类号 H01J37/20;H01J37/28 主分类号 H01J37/20
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