发明名称 |
SCANNING ELECTRON MICROSCOPE |
摘要 |
<P>PROBLEM TO BE SOLVED: To reduce an image drift occurring while measuring a plurality of points in a sample. <P>SOLUTION: A static elimination is conducted after acquiring a length measurement image by electron beam irradiation with a scanning at a magnification lower than that of a scanning for length measurement image acquisition. At that time, a magnification is so set that a scanning area becomes 20 μm square or larger and 200 μm square or smaller. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013065420(A) |
申请公布日期 |
2013.04.11 |
申请号 |
JP20110202560 |
申请日期 |
2011.09.16 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
HAYATA YASUNARI;OKAI NOBUHIRO;SATO HIDETOSHI;WANG JIKANG |
分类号 |
H01J37/20;H01J37/28 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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