发明名称 Method for Reducing Forming Voltage in Resistive Random Access Memory
摘要 Methods for producing RRAM resistive switching elements having reduced forming voltage include preventing formation of interfacial layers, and creating electronic defects in a dielectric film. Suppressing interfacial layers in an electrode reduces forming voltage. Electronic defects in a dielectric film foster formation of conductive pathways.
申请公布号 US2013089949(A1) 申请公布日期 2013.04.11
申请号 US201213673504 申请日期 2012.11.09
申请人 INTERMOLECULAR INC.;INTERMOLECULAR INC. 发明人 PHATAK PRASHANT B.;KUSE RONALD J.;TONG JINHONG
分类号 H01L45/00 主分类号 H01L45/00
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