发明名称 |
BONDING DEVICE AND BONDED SUBSTRATE MANUFACTURED USING SAME |
摘要 |
<p>A bonding device (20) according to an embodiment of the present invention is provided with: a transporting film (7) which is elastic and on which an Si wafer (1) can be disposed; a chamber (6) which is divided into a bonding chamber (9) and an adjoining chamber (10), the bonding chamber (9) being configured to bond the Si wafer (1) to a glass substrate (2); and a pressure change means which decreases the pressure in the bonding chamber (9) to cause the transporting film (7) to extend so that the Si wafer (1) is brought into contact with the glass substrate (2).</p> |
申请公布号 |
WO2013051395(A1) |
申请公布日期 |
2013.04.11 |
申请号 |
WO2012JP73952 |
申请日期 |
2012.09.19 |
申请人 |
SHARP KABUSHIKI KAISHA;SUGA, KATSUYUKI |
发明人 |
SUGA, KATSUYUKI |
分类号 |
H01L21/02;H01L21/677;H01L27/12 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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