| 摘要 |
<p>A production method for a spectroscopic sensor (1) comprises: a first step in which a cavity layer (21) is formed by etching a surface layer provided on a handle substrate; a second step in which, after the first step, a first mirror layer (22) is formed on top of the cavity layer (21); a third step in which, after the second step, a light transmission substrate (3) is bonded on the first mirror layer (22); a fourth step in which, after the third step, the handle substrate is removed from the cavity layer (21); a fifth step in which, after the fourth step, a second mirror layer (23) is formed on the cavity layer (21) having the handle substrate removed therefrom; and a sixth step in which, after the fifth step, a light detection substrate (4) is bonded on the second mirror layer.</p> |
