发明名称 |
SPUTTERING TARGET AND METHOD OF FABRICATION |
摘要 |
A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described. |
申请公布号 |
KR101253377(B1) |
申请公布日期 |
2013.04.11 |
申请号 |
KR20077020482 |
申请日期 |
2006.02.07 |
申请人 |
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发明人 |
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分类号 |
B21B1/02;B21B1/38;C23C14/34 |
主分类号 |
B21B1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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