发明名称 SPUTTERING TARGET AND METHOD OF FABRICATION
摘要 A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.
申请公布号 KR101253377(B1) 申请公布日期 2013.04.11
申请号 KR20077020482 申请日期 2006.02.07
申请人 发明人
分类号 B21B1/02;B21B1/38;C23C14/34 主分类号 B21B1/02
代理机构 代理人
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